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Proceedings Paper

Deep-UV resists with improved delay capabilities
Author(s): Dirk J. H. Funhoff; H. Binder; Reinhold Schwalm
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Paper Abstract

In this paper, we present our approaches to solve the delay problem, i.e., the formation of T- tops during the delay time between exposure and post-exposure bake. We investigated the distribution of the photoacid generator in the resist layer and the influence of basic contaminations in the formulation. T-topped patterns can be avoided by using appropriate developers. The incorporation of additives make the resist less sensitive to basic contaminations. Some formulations show no T-top formation under severe conditions for a considerable amount of time.

Paper Details

Date Published: 1 June 1992
PDF: 10 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59725
Show Author Affiliations
Dirk J. H. Funhoff, BASF AG (Germany)
H. Binder, BASF AG (Germany)
Reinhold Schwalm, BASF AG (Germany)


Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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