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Proceedings Paper

Nanoimprint technology and its applications
Author(s): L. Jay Guo
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Paper Abstract

The future of nanoscience and nanotechnology depends critically on the advance of micro- and nanofabrication technologies. Nanoimprint is an emerging lithographic technique that promises highthroughput patterning of nanostructures with simple equipmental setups. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. Nanoimprint can not only create resist patterns as in lithography, but can also imprint functional structures in polymers. This property can be exploited in many applications in the area of photonics and biotechnology. This article reviews basic principles of nanoimprint and some of the recent applications in this field.

Paper Details

Date Published: 4 April 2005
PDF: 12 pages
Proc. SPIE 5734, Quantum Dots, Nanoparticles, and Nanoclusters II, (4 April 2005); doi: 10.1117/12.597200
Show Author Affiliations
L. Jay Guo, Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 5734:
Quantum Dots, Nanoparticles, and Nanoclusters II
Diana L. Huffaker; Pallab K. Bhattacharya, Editor(s)

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