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Proceedings Paper

Nanofabrication with ultrafast lasers at critical intensity
Author(s): Kevin Ke; Ernest Hasselbrink; Alan J. Hunt
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Paper Abstract

A principal challenge facing nanotechnology is consistently producing well-defined features much smaller than the wavelength of visible light. We find that the remarkably sharp threshold for femtosecond laser-induced material damage enables nanomachining with unprecedented precision and versatility, allowing highly reproducible machining of structures with nanoscale features. Using this methodology, we demonstrate, in glass, surface trenches that are only tens of nanometers in width but micron in depth, sub-surface channels that are hundreds nanometers in diameter, tens of microns deep, and hundreds microns in length, and 3D microstructures such as cantilevers. Furthermore, we demonstrate reproducible nanometer scale features in mixed and amorphous materials that differ significantly from glass, such as gold and onion cells. This technique is versatile, not material specific, and has potentially broad applications for MEMS construction and design, high density microelectronics, nanofluidics, material science, and optical memory.

Paper Details

Date Published: 21 March 2005
PDF: 10 pages
Proc. SPIE 5714, Commercial and Biomedical Applications of Ultrafast Lasers V, (21 March 2005); doi: 10.1117/12.596922
Show Author Affiliations
Kevin Ke, Univ. of Michigan (United States)
Ernest Hasselbrink, Univ. of Michigan (United States)
Alan J. Hunt, Univ. of Michigan (United States)

Published in SPIE Proceedings Vol. 5714:
Commercial and Biomedical Applications of Ultrafast Lasers V
Joseph Neev; Christopher B. Schaffer; Andreas Ostendorf; Stefan Nolte, Editor(s)

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