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Proceedings Paper

Deprotonation mechanism of poly(4-hydroxystyrene) and its derivative
Author(s): Atsuro Nakano; Kazumasa Okamoto; Yukio Yamamoto; Takahiro Kozawa; Seiichi Tagawa; Toshiyuki Kai; Hiroaki Nemoto; Tsutomu Shimokawa
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Paper Abstract

With the shrinkage of pattern sizes, the elucidation of reaction mechanisms at molecular level has become essential to resist design. Especially, proton dynamics is the most important issue for sensitivity and resolution of chemically amplified resists. Also, nanoscale topography of patterned resist surface such as line edge roughness may be explained by precise proton dynamics. In chemically amplified resists for post-optical lithographies such as EUV and electron beam lithography, it has been reported that protons come not from acid generators but from base polymers. Determining proton sources is a key to understanding reaction mechanisms at molecular level. In this article, we investigated deprotonation mechanism of poly(4-hydroxystyrene) and poly(4-methoxystyrene) on the exposure to ionizing radiation.

Paper Details

Date Published: 4 May 2005
PDF: 6 pages
Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); doi: 10.1117/12.596827
Show Author Affiliations
Atsuro Nakano, Osaka Univ. (Japan)
Kazumasa Okamoto, Osaka Univ. (Japan)
Yukio Yamamoto, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Toshiyuki Kai, JSR Corp. (Japan)
Hiroaki Nemoto, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)


Published in SPIE Proceedings Vol. 5753:
Advances in Resist Technology and Processing XXII
John L. Sturtevant, Editor(s)

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