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Proceedings Paper

EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas
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Paper Abstract

The 13 nm emission that results from laser plasmas created from tin targets, results from a milliard of transitions occurring in many ions of tin (Sn6+-Sn13+). Understanding the energy manifolds within these multiple states will further our ability to manipulate energy into the narrow emission band demanded by EUV Lithography. A combined experimental theoretical program is underway to measure and interpret the detailed EUV emission spectra from laser plasmas suitable for EUVL, particularly mass-limited droplet laser plasmas. We employ high resolution spectroscopy in the 2 - 60 nm wavelength regions to characterize the emission from the plasma. This is interpreted with the aid of combined hydrodynamic/ radiation transport computer models. The results of this study will have impact on the in-band EUV conversion efficiency, estimation of the out-of-band short-wavelength emission, and in the development of electron temperature plasma diagnostics.

Paper Details

Date Published: 6 May 2005
PDF: 10 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.596781
Show Author Affiliations
Simi George, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Chiew-Seng Koay, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Kazutoshi Takenoshita, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Robert Bernath, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Moza Al-Rabban, Qatar Univ. (Qatar)
Christian Keyser, Naval Research Lab. (United States)
Vivek Bakshi, SEMATECH (United States)
Howard Scott, Lawrence Livermore National Lab. (United States)
Martin Richardson, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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