Share Email Print
cover

Proceedings Paper

Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The EUVL collector mirror reflectivity degradation can be measured as erosion of the mirror surface caused by the high energy ion emissions. Characterizing the ion emission permits the analysis of the mechanisms of erosion and provides the capability to reduce the high energy ion emission which directly reduces the erosion rate. The degradation can also be measured as deposition of particulate debris on the mirror surface. The debris particles have sizes of only a few nanometers. We have demonstrated that the use of electrostatic repeller fields mitigates large fraction of the particle transfer. Our microscopic tin-doped droplet target is a mass-limited target and is designed to limit the flux of uncharged particulate matter emanating from the target, with the eventual objective of only generating charged material. The latter then may be inhibited from degrading EUV optics with the use of electrostatic repeller fields and other mitigation schemes. We present tin-doped droplet target ion emission characteristics in terms of ion energy distribution obtained using our ion spectrometer. Extensive studies on particle generation by controlling plasma conditions and the repeller field effect on individual ion species and particles is also described.

Paper Details

Date Published: 6 May 2005
PDF: 9 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.596764
Show Author Affiliations
Kazutoshi Takenoshita, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Chiew-Seng Koay, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Somsak Teerawattansook, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Martin Richardson, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Vivek Bakshi, SEMATECH (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

© SPIE. Terms of Use
Back to Top