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Proceedings Paper

Pulsed excimer lasers for thin film applications
Author(s): Ralph F. Delmdahl
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Paper Abstract

Ongoing progress in material research and processing industry is fueled to a large extent by the technique of pulsed laser deposition (PLD). With this powerful and versatile deposition method, multi-component target materials can be ablated and deposited onto a substrate to form functional layers with tailored physical properties. Monitoring of growth parameters such as thickness and surface roughness is mostly performed in-situ via electron diffraction or other diagnostic tools. High pulse energy excimer lasers with photon energies as high as 7.9 eV lend maximum flexibility to the technique of pulsed laser deposition since virtually every target material is amenable to excimer laser ablation and its subsequent stoichiometric transfer to a substrat. Spectral properties as well as recent technical advances in excimer lasers for thin film applications are shown in this paper.

Paper Details

Date Published: 8 October 2004
PDF: 6 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596760
Show Author Affiliations
Ralph F. Delmdahl, Lambda Physik AG (Germany)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication

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