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Proceedings Paper

High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL
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Paper Abstract

Light sources based on laser plasmas using tin as target material are known to provide high conversion efficiency of laser power to emission in the 13.5 nm spectral region. In addition, laser plasmas produced from microscopic droplet targets enable the utilization of the mass-limited concept which minimizes the effect of target debris produced from the laser plasma interaction. By combining the mass-limited target concept and tin as the choice of target material, we are developing an extreme-ultraviolet (EUV) light source that can supply high power while remaining essentially debris-free. This source uses tin-doped microscopic droplet liquid targets that are generated at high-repetition rates (>30 kHz), which allows convenient upward power scaling when coupled with a high averaged-power laser. Detailed studies of the radiation from this source have been made using a precision Nd:YAG laser. Broad parametric studies of the conversion efficiency along with in-band spectroscopy of this EUV source have been performed. The parametric dependence of conversion efficiency is established based on measurements made by the Flying Circus diagnostic tool and a calibrated high-resolution flat-field spectrometer. These measurements have been independently confirmed by the Flying Circus 2 team.

Paper Details

Date Published: 6 May 2005
PDF: 14 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.596753
Show Author Affiliations
Chiew-Seng Koay, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Simi George, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Kazutoshi Takenoshita, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Robert Bernath, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Etsuo Fujiwara, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Martin Richardson, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)
Vivek Bakshi, CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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