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Proceedings Paper

Simulations for high resolution contacts for near field x-ray lithography
Author(s): Antony J. Bourdillon; Chris B. Boothroyd; Gwyn P. Williams; Yuli Vladimirsky
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Proc. SPIE 5751, Emerging Lithographic Technologies IX, ; doi: 10.1117/12.596629
Show Author Affiliations
Antony J. Bourdillon, UhrlMasc, Inc. (United States)
Chris B. Boothroyd, Institute of Materials Research and Engineering (Singapore)
Gwyn P. Williams, Thomas Jefferson National Accelerator Facility (United States)
Yuli Vladimirsky, UhrlMasc, Inc. (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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