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Proceedings Paper

Laser micromachining of optical devices
Author(s): Giedrius Kopitkovas; Thomas Lippert; Christian David; Rokas Sulcas; Jonathan Hobley; Alexander J. Wokaun; Jens Gobrecht
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Paper Abstract

The combination of a gray tone phase mask with a laser assisted wet etching process was applied to fabricate complex microstructures in UV transparent dielectric materials. This one-step method allows the generation of arrays of plano-convex and Fresnel micro-lenses using a conventional XeCl excimer laser and an absorbing liquid, which is in contact with the UV transparent material. An array of plano-convex micro-lenses was tested as beam homogenizer for a high power XeCl excimer and ps Nd:YAG laser. The roughness of the etched features varies from several μm to 10 nm, depending on the laser fluence and concentration of the dye in the organic liquid. The etching process can be divided into several etching mechanisms which vary with laser fluence.

Paper Details

Date Published: 8 October 2004
PDF: 11 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596387
Show Author Affiliations
Giedrius Kopitkovas, Paul Scherrer Institut (Switzerland)
Thomas Lippert, Paul Scherrer Institut (Switzerland)
Christian David, Paul Scherrer Institut (Switzerland)
Rokas Sulcas, EKSPLA Ltd. (Lithuania)
Jonathan Hobley, Tohoku Univ. (Japan)
Alexander J. Wokaun, Paul Scherrer Institut (Switzerland)
Jens Gobrecht, Paul Scherrer Institut (Switzerland)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)

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