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Proceedings Paper

Study on high-accuracy displacement interferometer for lithography application
Author(s): Zhaogu Cheng; Haijun Gao; Xiongliang Chai; Zhigao Ning; Huijie Huang
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Paper Abstract

A measurement interferometer available for wafer stage metrology of lithography has been investigated by means of resolution-extending of optical subdivision based on commercial interferometers. Factors that determine the accuracy, linearity and repeatability of nanometer-scale measurements of displacements exceeding hundreds of millimeters and of target velocities exceeding hundreds of millimeters per second are also discussed.

Paper Details

Date Published: 8 October 2004
PDF: 5 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596381
Show Author Affiliations
Zhaogu Cheng, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Haijun Gao, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Xiongliang Chai, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Zhigao Ning, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)

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