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Proceedings Paper

Characteristic of diffractive optical element for arbitrary pattern beam shaping
Author(s): Takayuki Hirai; Keiji Fuse; Kenichi Kurisu; Keiji Ebata; Kyoji Matsushima
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Paper Abstract

Laser materials processing has been used increasingly over the wide area of electronic industries, especially for drilling microvias in printed circuit boards, and poly-silicon annealing for thin film transistor of liquid crystal display. Intensity distribution of laser beam is usually a non-uniform gaussian profile. Therefore, the demand for uniform intensity distribution is rising rapidly in some applications of heat processing. To obtain higher uniformity, beam homogenizer of a diffractive optical element (DOE) has recently been developed and introduced to some promising applications. Through the improvement of optical design algorithms and micro-fabrication techniques of a phase pattern of DOE, it becomes possible to convert a non-uniform gaussian distribution not only into a simple distribution like a square and a line but also into a complicated distribution like a distribution of printed circuit pattern. In this study, we introduce a design and fabrication result of beam shaper of DOE that can convert a gaussian distribution into the distribution of a printed circuit pattern, and present the possibility and the point at issue of new laser material processing by using such optics.

Paper Details

Date Published: 8 October 2004
PDF: 6 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596369
Show Author Affiliations
Takayuki Hirai, Sumitomo Electric Industries, Ltd. (Japan)
Keiji Fuse, Sumitomo Electric Industries, Ltd. (Japan)
Kenichi Kurisu, Sumitomo Electric Industries, Ltd. (Japan)
Keiji Ebata, Sumitomo Electric Industries, Ltd. (Japan)
Kyoji Matsushima, Kansai Univ. (Japan)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)

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