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Proceedings Paper

Nanomachining of inorganic transparent materials using an x-ray exciton method
Author(s): Tetsuya Makimura; Yoichi Kenmotsu; Hisao Miyamoto; Michiaki Mori; Kiminori Kondo; Kouichi Murakami
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Paper Abstract

We have investigated microfabrication of inorganic transparent materials using laser plasma soft X-rays with the diffraction limit of 10 nm. As a soft X-ray source, we used Ta laser plasma soft X-rays, whch has a light emission band at around 10 nm. A SiO2 film was confirmed to have absorption band in the soft X-ray region. Micromachining a quartz plate was demonstrated by irradiation with focused soft X-rays and pulsed 266 nm Nd:YAG laser light. The quartz plates are ablated smoothly at 85 nm/shots. It is found that more than 40% of 266 nm laser light is absorbed by the quartz plates just after soft X-ray irradiation at room temperature. Thus, it is shown that a transient state such as an X-ray generated exciton (X-ray exciton), which have absorption band in UV region, are generated by soft X-ray irradiation. The micromachining technique (X-ray exciton method) can utilize the high space resolution of soft X-ray and the high energy density of conventional UV/visible laser light. Further, we found that a variety of materials such as SiO2, LiNO3, Si, CaF2, LiF and Al2O3 are ablated smoothly by irradiation of the focused laser plasma soft X-rays without 266 nm laser light.

Paper Details

Date Published: 8 October 2004
PDF: 6 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596284
Show Author Affiliations
Tetsuya Makimura, Univ. of Tsukuba (Japan)
Yoichi Kenmotsu, Univ. of Tsukuba (Japan)
Hisao Miyamoto, Univ. of Tsukuba (Japan)
Michiaki Mori, Japan Atomic Energy Research Institute (Japan)
Kiminori Kondo, Osaka Univ. (Japan)
Kouichi Murakami, Univ. of Tsukuba (Japan)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)

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