Share Email Print
cover

Proceedings Paper

Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser
Author(s): Sangjin Kwon; Won-Seok Chang; Sungho Jeong
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Nanopatterning on the surface of a spin-coated photoresist using a near-field scanning optical microscope (NSOM) is investigated. A cantilever type nanoprobe whose aperture diameter is approximately 100 nm is installed on the NSOM to produce the nanopatterns. The optical near-field at the tip of the nanoprobe is produced by focusing the light from a He-Cd laser on the entrance side of the nanoprobe. The variation of pattern size are examined with respect to process parameters such as laser beam power, scan speed of the nanoprobe, and thickness of the coated photoresist. The linewidth of nanopatterns reduces for decreasing laser power and increasing scan speed. Using this method, about 200 nm size nanopatterns are produced. Fabrication of a two-dimensional nanopattern of arbitrary shape is demonstrated.

Paper Details

Date Published: 8 October 2004
PDF: 5 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.595819
Show Author Affiliations
Sangjin Kwon, Gwangju Institute of Science and Technology (South Korea)
Won-Seok Chang, Korea Institute of Machinery and Materials (South Korea)
Sungho Jeong, Gwangju Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)

© SPIE. Terms of Use
Back to Top