Share Email Print
cover

Proceedings Paper

Volume-change thermal-lithography technique for ultra-high density optical ROM mastering process
Author(s): Masashi Kuwahara; Jooho Kim; Duseop Yoon; Junji Tominaga
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We have developed a novel lithography technique, which we refer to here as Volume-Change Thermal-Lithography (VCTL), for application to the mastering process in a manufacture of next-generation ultra-high density optical ROM disks. Using a visible laser beam and conventional optics, we have succeeded in fabricating minute dots with diameters of under 100 nm and with interdot spacing far beyond the optical diffraction limit at a practical fabrication speed of 3 m/s. The combination of the temperature distribution induced by a focused laser beam with a Gaussian profile and a specially designed multilayer consisting of TbFeCo and ZnS-SiO2 was utilized for fabricating the aforementioned nano-structures. A focused laser beam with a Gaussian profile can generate a peak temperature area far smaller than its spot size. TbFeCo and ZnS-SiO2 undergo mutual diffusion when heated, a result of which is that their volume expands. An incident pulsed laser induces mutual diffusion restricted to the highest heated area. As a result, minute convex structures appear as dots on the sample surface. In addition to fabrication of continuous dot patterns, as a demonstration, small letters with dimensions of approximately 1 μm were drawn by specific dot arrangement, confirming the strong possibility of the technique.

Paper Details

Date Published: 8 October 2004
PDF: 6 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.595807
Show Author Affiliations
Masashi Kuwahara, National Institute of Advanced Industrial Science and Technology (Japan)
Jooho Kim, Samsung Electronics Co., Ltd. (South Korea)
Duseop Yoon, Samsung Electronics Co., Ltd. (South Korea)
Junji Tominaga, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)

© SPIE. Terms of Use
Back to Top