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Proceedings Paper

Active photo-physical processes in the pulsed UV nanosecond laser exposure of photostructurable glass ceramic materials
Author(s): Frank E. Livingston; Paul M. Adams; Henry Helvajian
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Paper Abstract

We have performed experiments in which sample coupons of a commercial photostructurable glass ceramic (PSGC) material have been carefully exposed to various photon doses by pulsed UV nanosecond lasers at λ = 266 nm and λ = 355 nm. Following UV laser irradiation, the samples were analyzed by optical transmission spectroscopy to investigate the latent image and identify the photo-induced trapped (defect) state. The irradiated samples were thermally processed and the quenching of this trapped state and the concurrent growth of a spectral band associated with the formation of nanometer-scale metallic clusters was then observed using optical transmission spectroscopy. The results show that exposure at λ = 266 nm generates a defect state distribution that is markedly broader compared with the defect state distribution that is generated via λ = 355 nm excitation. The defect concentration formed with λ = 266 nm radiation is also much larger compared with the defect concentration associated with λ = 355 nm exposure. The results reveal that the metallic cluster concentration saturates with increasing laser irradiance, while the defect state concentration does not saturate. These studies have identified two precursor states of the exposed PSGC material that are tractable via spectroscopic techniques and could be used to refine the laser exposure and thermal processing of PSGC materials.

Paper Details

Date Published: 8 October 2004
PDF: 7 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.595791
Show Author Affiliations
Frank E. Livingston, The Aerospace Corp. (United States)
Paul M. Adams, The Aerospace Corp. (United States)
Henry Helvajian, The Aerospace Corp. (United States)


Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)

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