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Proceedings Paper

Joining the design and mask flows for better and cheaper masks
Author(s): Puneet Gupta; Andrew B. Kahng; Chul-Hong Park; P. Sharma; Dennis M. C. Sylvester; Jun Yang
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Paper Abstract

Today's design-manufacturing interfaces have only minimal information exchange. Lack of information on either side leads to under-performance due to too much guardbanding, and increased mask cost and increased turnaround time due to over-correction. In this work we present techniques that simultaneously utilize design and manufacturing information to improve mask quality and reduce mask cost.

Paper Details

Date Published: 6 December 2004
PDF: 12 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.594095
Show Author Affiliations
Puneet Gupta, Univ. of California/San Diego (United States)
Andrew B. Kahng, Univ. of California/San Diego (United States)
Chul-Hong Park, Univ. of California/San Diego (United States)
P. Sharma, Univ. of California/San Diego (United States)
Dennis M. C. Sylvester, Univ. of Michigan (United States)
Jun Yang, Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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