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Proceedings Paper

Portable surface-enhanced Raman toxic chemical analyzer development
Author(s): Wade E. Selph; Kimchinh K-C Tran; Michael J. Hurwitz; Jean Pierre Alarie; W. S. Sutherland; David L. Stokes; Tarasarkar Pal; Tuan Vo-Dinh
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Paper Abstract

GAMMA-METRICS and Oak Ridge National Laboratory (ORNL) have developed a prototype portable Toxic Chemical Analyzer (TCA) for environmental screening using surface enhanced aman scattering (SERS) technology. The focus is on detection of anthropogenic chemicals such as polycyclic aromatic compounds. In this instrument a laser illuminates a small sample of analyte on a substrate of silver coated particles. Light scattered from the illuminated spot is analyzed to determine the chemicals in the analyte. The development process involved miniaturizing the instrument from a large laboratory table-top device to a small portable package, then ruggedizing the components and the packaging to withstand field conditions. A reference design for a commercial instrument has been developed. The instrument employs internal direct optics or, optionally, an external, in-situ probe connected by fiber optics to internal components. A substrate dispenser is used to refresh the substrate in preparation for a new measurement. Measurement results to date show that high quality spectra can be obtained with the portable system. A prototype instrument is currently undergoing field trials. Data from these trials are used to refine a reference instrument design. Measurements with the prototype show that the design is capable of screening for a wide variety of environmental contaminants. Trends toward miniaturization of components and increased sensitivity of measurement procedures lead to growth and increased optimization of the TCA.

Paper Details

Date Published: 1 May 1992
PDF: 9 pages
Proc. SPIE 1637, Environmental and Process Monitoring Technologies, (1 May 1992); doi: 10.1117/12.59337
Show Author Affiliations
Wade E. Selph, GAMMA-METRICS (United States)
Kimchinh K-C Tran, GAMMA-METRICS (United States)
Michael J. Hurwitz, GAMMA-METRICS (United States)
Jean Pierre Alarie, Oak Ridge National Lab. (United States)
W. S. Sutherland, Oak Ridge National Lab. (United States)
David L. Stokes, Oak Ridge National Lab. (United States)
Tarasarkar Pal, Oak Ridge National Lab. (United States)
Tuan Vo-Dinh, Oak Ridge National Lab. (United States)

Published in SPIE Proceedings Vol. 1637:
Environmental and Process Monitoring Technologies
Tuan Vo-Dinh, Editor(s)

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