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Proceedings Paper

LIF measurement of CH* radical state through chemical sputtering
Author(s): Noriaki Asada; Masato Yasumoto; Nagao Kamijo
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Paper Abstract

The detection of CH* radicals was made by the laser induced fluorescence method. CH* radicals were formed through chemical sputtering processes of isotropic graphite targets irradiated by hydrogen ions in the low keV range and at temperatures around 700K. Fluorescent spectra of CH* radicals induced by a flashlamp pumped dye pulse laser were obtained by a photo-multiplier tube as a function of wavelength. The detailed structure of the chemical and electronic states of CH* radicals can be extracted from highly resolved fluorescent spectra.

Paper Details

Date Published: 14 May 1992
PDF: 5 pages
Proc. SPIE 1636, Applied Spectroscopy in Materials Science II, (14 May 1992); doi: 10.1117/12.59309
Show Author Affiliations
Noriaki Asada, Government Industrial Research Institute/Osaka (Japan)
Masato Yasumoto, Government Industrial Research Institute/Osaka (Japan)
Nagao Kamijo, Government Industrial Research Institute/Osaka (Japan)


Published in SPIE Proceedings Vol. 1636:
Applied Spectroscopy in Materials Science II
William G. Golden, Editor(s)

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