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Proceedings Paper

Near-field enhanced laser-assisted deposition
Author(s): Jing Shi; Yongfeng Lu; Xiaoyu Chen; R. S. Cherukuri; Kiran K. Mendu; Nagaraj Batta
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Paper Abstract

Diamond-like carbon (DLC) coated tips have been successfully applied in field emitter arrays, and scanning probe microscope (SPM) based nanofabrications. DLC deposition on tips is conventionally realized by thermal and plasma-enhanced chemical vapor deposition processes. In this study, we use laser-assisted method employing strongly enhanced near field around the tip apex for DLC deposition. DLC films were deposited on tungsten (W) tips under KrF excimer laser irradiation in a benzene solution and in a laser chemical vapor deposition (LCVD) chamber. Simulation results showed a highly localized optical field enhancement at the tip apex. There was also an optical-field gradient from apex to tip body. Experiment results showed that a locally confined DLC film was deposited based on energy dispersive X-ray (EDX) analysis. Raman spectra showed that at positions close to apexes, films tend to be more diamond-like. This implies that quality of DLC film varies according to local optical intensity along the tip. Hence, the deposition process was confirmed to be induced by the local near field generated by laser and nanotip interaction.

Paper Details

Date Published: 12 April 2005
PDF: 7 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.591120
Show Author Affiliations
Jing Shi, Univ. of Nebraska/Lincoln (United States)
Yongfeng Lu, Univ. of Nebraska/Lincoln (United States)
Xiaoyu Chen, National Univ. of Singapore (Singapore)
R. S. Cherukuri, Univ. of Nebraska/Lincoln (United States)
Kiran K. Mendu, Univ. of Nebraska/Lincoln (United States)
Nagaraj Batta, Univ. of Nebraska/Lincoln (United States)

Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

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