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Proceedings Paper

A high-end mask writer using a spatial light modulator
Author(s): Ulric B. Ljungblad; Per Askebjer; Tord Karlin; Tor Sandstrom; Henrik Sjoeberg
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Paper Abstract

This paper presents the properties of the Sigma7300 which is a commercial DUV laser pattern generator based on spatial light modulator (SLM) technology designed to meet the requirements of the 65-nm technology node and below. The introduction of spatial light modulators provides a possibility for optical mask writers to combine high resolution and accuracy with short write time making it possible to write most of the high end mask layers in a cost effective way. The Sigma7300 mask writer is developed by Micronic Laser Systems whereas the SLM, which is a combined MEMS and CMOS component with individually controllable movable micromirrors, is developed by the Fraunhofer-IPMS institute in Dresden. The SLM allows parallel writing of one million pixels with a frame rate of up to 2 kHz. The technology offers resolution enhancement advantages from stepper technology not available in other mask patterning tools.

Paper Details

Date Published: 22 January 2005
PDF: 10 pages
Proc. SPIE 5721, MOEMS Display and Imaging Systems III, (22 January 2005); doi: 10.1117/12.590934
Show Author Affiliations
Ulric B. Ljungblad, Micronic Laser Systems AB (Sweden)
Per Askebjer, Micronic Laser Systems AB (Sweden)
Tord Karlin, Micronic Laser Systems AB (Sweden)
Tor Sandstrom, Micronic Laser Systems AB (Sweden)
Henrik Sjoeberg, Micronic Laser Systems AB (Sweden)


Published in SPIE Proceedings Vol. 5721:
MOEMS Display and Imaging Systems III
Hakan Urey; David L. Dickensheets, Editor(s)

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