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Proceedings Paper

Fabrication of vertically coupled silicon nanophotonic circuits via SIMOX 3D sculpting
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Paper Abstract

A new process has been developed to create vertically-integrated photonic and optoelectronic circuits in silicon. The approach is the 3-D extension of the SIMOX process where buried SiO2 sections can be selectively created by using oxygen implantation, through a mask, followed by annealing. By controlling the implant energy, dose, mask area and thickness, arbitrary 3-D arrangements of Silicon/SiO2 can be created. The process has been used to create vertically coupled microdisk resonators and add-drop wavelength multiplexers on a silicon wafer.

Paper Details

Date Published: 25 March 2005
PDF: 5 pages
Proc. SPIE 5729, Optoelectronic Integrated Circuits VII, (25 March 2005); doi: 10.1117/12.590863
Show Author Affiliations
Bahram Jalali, Univ. of California/Los Angeles (United States)
Prakash Koonath, Univ. of California/Los Angeles (United States)
Tejaswi Indukuri, Univ. of California/Los Angeles (United States)


Published in SPIE Proceedings Vol. 5729:
Optoelectronic Integrated Circuits VII
Louay A. Eldada; El-Hang Lee, Editor(s)

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