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Proceedings Paper

Development of line-shaped optical system for YAG2ω laser annealing used in the manufacture of low-temperature poly-Si TFT
Author(s): Tatsuki Okamoto; Kazutoshi Morikawa; Atsuhiro Sono; Yukio Sato; Junichi Nishimae
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Paper Abstract

We have developed a new optical system that transforms the circle profile beam generated with near Gaussian intensity distribution by the YAG2ω laser (second harmonics of a Q-switched Nd:YAG laser) into a line-profile beam. This transformed bean has uniform distribution to within 5% in the longitudinal direction, and is about 100 mm long and 40 micron wide. For homogenization in the longitudinal direction, we employ a waveguide plate homogenizer. The laser beam is divided by waveguide plates, and the divided beams are overlapped on the surface of the works. We successfully reduced interference fringes by increasing the fixed optical pass difference beyond the inherent time and coherent length for every divided pair of adjacent beams under a controlled space coherent length. In the width direction, the laser beam is focused up to the limited M2 value.

Paper Details

Date Published: 12 April 2005
PDF: 8 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.590383
Show Author Affiliations
Tatsuki Okamoto, Mitsubishi Electric Corp. (Japan)
Kazutoshi Morikawa, Mitsubishi Electric Corp. (Japan)
Atsuhiro Sono, Mitsubishi Electric Corp. (Japan)
Yukio Sato, Mitsubishi Electric Corp. (Japan)
Junichi Nishimae, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

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