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Proceedings Paper

Mechanical stability of spatial light modulators in microlithography
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Paper Abstract

The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a programmable mask, which allows parallel writing of 1 million pixels with a frame rate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of pattern features. This paper describes the function of the SLM with an emphasis on the stability of the mirror deflection and a method to improve it which has been implemented.

Paper Details

Date Published: 22 January 2005
PDF: 8 pages
Proc. SPIE 5721, MOEMS Display and Imaging Systems III, (22 January 2005); doi: 10.1117/12.590082
Show Author Affiliations
Ulrike A. Dauderstadt, Fraunhofer Institute for Microelectonic Circuits and Systems (Germany)
Peter Duerr, Fraunhofer Institute for Microelectonic Circuits and Systems (Germany)
Ulric B. Ljungblad, Micronic Laser Systems AB (Sweden)
Tord Karlin, Micronic Laser Systems AB (Sweden)
Harald Schenk, Fraunhofer Institute for Microelectonic Circuits and Systems (Germany)
Hubert Lakner, Fraunhofer Institute for Microelectonic Circuits and Systems (Germany)


Published in SPIE Proceedings Vol. 5721:
MOEMS Display and Imaging Systems III
Hakan Urey; David L. Dickensheets, Editor(s)

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