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Proceedings Paper

F2-laser writing of silica optical waveguides in silicone rubber
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Paper Abstract

F2-laser writing of silica (SiO2) optical waveguides has been successfully demonstrated on the surface of silicone [(SiO(CH3)2)n] rubber by the photochemical modification of silicone into silica. The 2-mm-thick silicone rubber was exposed to the 157-nm F2-laser beam through a thin (~0.2 mm) air layer. A proximity Cr-on-CaF2 photomask with 8- to 16-micron-wide slits controlled the exposure size to define the width of the silica waveguide. Optimum laser conditions to generate crack-free waveguides with good transparency were found by varying the laser fluence, pulse repetition rate and total exposure. The optimized waveguides were found to guide both red (~635-nm) and infrared (~1550-nm) wavelengths with light end-fired from standard single-mode fiber.

Paper Details

Date Published: 12 April 2005
PDF: 6 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.589392
Show Author Affiliations
Masayuki Okoshi, Univ. of Toronto (Canada)
Jianzhao Li, Univ. of Toronto (Canada)
Peter Robert Herman, Univ. of Toronto (Canada)


Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

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