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Proceedings Paper

Fabrication of three-dimensional photonic crystals with multilayer photolithography
Author(s): Peng Yao; Garrett J. Schneider; Binglin Miao; Dennis W. Prather; Eric D. Wetzel; Daniel J. O'Brien
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Paper Abstract

We have developed a new approach for the fabrication of three-dimensional photonic crystals based on multi-layer photolithography. This method, which uses commercially available photoresist, allows parallel fabrication of three-dimensional photonic crystals, and possesses the flexibility to create a variety of different lattice arrangements and the freedom of arbitrary defect introduction. We describe in this work how this method is derived from mature two-dimensional photolithography and demonstrate it with the fabrication of multi-layer woodpile structures with and without defects as well as other unique three-dimensional microstructures.

Paper Details

Date Published: 22 January 2005
PDF: 9 pages
Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.589139
Show Author Affiliations
Peng Yao, Univ. of Delaware (United States)
Garrett J. Schneider, Univ. of Delaware (United States)
Binglin Miao, Univ. of Delaware (United States)
Dennis W. Prather, Univ. of Delaware (United States)
Eric D. Wetzel, Army Research Lab. (United States)
Daniel J. O'Brien, Army Research Lab. (United States)


Published in SPIE Proceedings Vol. 5720:
Micromachining Technology for Micro-Optics and Nano-Optics III
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

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