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Proceedings Paper

Guided-wave optical pressure sensor responding only to changing pressure
Author(s): Yoshisumi Endo; Masashi Ohkawa; Seishi Sekine; Takashi Sato
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Paper Abstract

In this paper, an original guided-wave optical pressure sensor that responds only to rapid pressure change is described. The proposed sensor is based on a conventional guided-wave optical pressure sensor using intermodal interference, with an added semi-closed space with a small hole under the bottom side of the diaphragm. By the addition of this semi-closed space, the sensor, unlike conventional sensors, can withstand high static pressure. When there is a sudden change in ambient pressure, pressure within the semi-closed space cannot quickly adjust due to the small hole that restricts fluid flow. So, pressure difference is induced on the diaphragm for a short while. Thus, the sensor shows a response only to changes in pressure, not to static pressure. We examined the step response of the sensor, that is, the output characteristics for sudden pressure change. The diaphragm dimensions of the fabricated sensor were 14 mmX14 mmX0.22 mm. Also, the volume of the semi-closed space was 14 mmX14 mmX1.8 mm, and the sectional area of the small hole was 93 umX25 um. In this experiment, the pressure in a 30 cmX28 cmX30 cm closed box, in which the fabricated sensor was placed, was suddenly increased by 0.78 kPa. Due to the pressure change, the output intensity decreased by approximately 20 % of the initial intensity level. Approximately 1.4 sec after the step-like change in pressure, output intensity returned to the initial level.

Paper Details

Date Published: 31 March 2005
PDF: 8 pages
Proc. SPIE 5728, Integrated Optics: Devices, Materials, and Technologies IX, (31 March 2005); doi: 10.1117/12.588457
Show Author Affiliations
Yoshisumi Endo, Niigata Univ. (Japan)
Masashi Ohkawa, Niigata Univ. (Japan)
Seishi Sekine, Niigata Univ. (Japan)
Takashi Sato, Niigata Univ. (Japan)

Published in SPIE Proceedings Vol. 5728:
Integrated Optics: Devices, Materials, and Technologies IX
Yakov Sidorin; Christoph A. Waechter, Editor(s)

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