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Proceedings Paper

Comparison of glass processing using high-repetition femtosecond (800 nm) and UV (255 nm) nanosecond pulsed lasers
Author(s): Dimitris M. Karnakis; Martyn R. H. Knowles; Kevin T. Alty; Martin Schlaf; Howard V. Snelling
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Paper Abstract

Laser processing of glass is of significant commercial interest for microfabrication of "lab-on-a-chip" microfluidic devices. High repetition rate pulsed lasers have been investigated and provide adequate processing speeds but suffer from the inherent risk of laser-induced microcracking and other collateral damage induced in the glass. In this paper we present a comparative study between nanosecond deep UV (255nm) frequency doubled copper laser and femtosecond Ti:Sapphire (800nm) regenerative amplifier laser machining of borosilicate glass. Microchannel scribing and high aspect ratio hole drilling is demonstrated in thick glass using direct writing and mask projection techniques. The resulting material structure geometries have been examined using SEM microscopy and white light interferometry. The feasibility of glass laser machining and the significance of each laser type for this application are discussed.

Paper Details

Date Published: 22 January 2005
PDF: 12 pages
Proc. SPIE 5718, Microfluidics, BioMEMS, and Medical Microsystems III, (22 January 2005); doi: 10.1117/12.588194
Show Author Affiliations
Dimitris M. Karnakis, Oxford Lasers Ltd. (United Kingdom)
Martyn R. H. Knowles, Oxford Lasers Ltd. (United Kingdom)
Kevin T. Alty, Univ. of Hull (United Kingdom)
Martin Schlaf, Univ. of Hull (United Kingdom)
Howard V. Snelling, Univ. of Hull (United Kingdom)


Published in SPIE Proceedings Vol. 5718:
Microfluidics, BioMEMS, and Medical Microsystems III
Ian Papautsky; Isabelle Chartier, Editor(s)

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