Share Email Print
cover

Proceedings Paper

Pulse duration and energy density influence on laser processing of metals with short and ultrashort pulses
Author(s): Ronan Le Harzic; Detlef Breitling; S. Sommer; Christian Fohl; S. Valette; Karsten Konig; Friedrich Dausinger; Eric Audouard
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Influence of pulse duration on microprocessing of Al is studied. Results show noticeable differences in terms of quality, burr height and remolten or recast matter into micromachined grooves at high fluence regime for 120fs and 4,5 ps pulse duration. At 120 fs experimental results of penetration depth are found to be 2 or 3 times higher than the theoretical optical penetration depth and is lowered to this value with increasing pulse duration. At high fluence regime up to 2 J/cm2, ablation thresholds are found to be in the range 10 times higher than for the case of 1 J/cm2. Penetration depths are higher by a factor 10 to 20 than the theoretical optical penetration depth. The ablation rate is nearly constant until 1 ps and then falls down to 2 times lower values and decreases regularly until 4,5 ps. This time is supposed to correspond to a critical pulse width between ultrashort and short regime.

Paper Details

Date Published: 12 April 2005
PDF: 8 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.587540
Show Author Affiliations
Ronan Le Harzic, Univ. Stuttgart (Germany)
Fraunhofer Institute of Biomedical Technology (Germany)
Detlef Breitling, Univ. Stuttgart (Germany)
S. Sommer, Univ. Stuttgart (Germany)
Christian Fohl, Forschungsgesellschaft fur Strahlwerkzeuge mbH (Germany)
S. Valette, Lab. TSI/Univ. Jean Monnet, CNRS (France)
Karsten Konig, Fraunhofer Institute of Biomedical Technology (Germany)
Friedrich Dausinger, Univ. Stuttgart (Germany)
Eric Audouard, Lab. TSI/Univ. Jean Monnet, CNRS (France)


Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

© SPIE. Terms of Use
Back to Top