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Proceedings Paper

LOG-filter-based inspection of cluster Mura and vertical-band Mura on liquid crystal displays
Author(s): Hsin-Chia Chen; Li-Te Fang; Louis Lee; Chao-Hua Wen; Shang-Yuan Cheng; Sheng-Jyh Wang
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Paper Abstract

In this paper, we suggest to use a 2-D LOG filter to inspect Cluster Mura defects on the FOS images of LCDs, either for round-type Cluster Mura defects or rectangular-type Cluster Mura defects. With the 2-D LOG filter, the optimal threshold is analyzed with the SEMU formula. Also, we propose a curvature test approach to detect V-Band Mura defects. In the curvature test approach, a 1-D LOG filter is used to achieve the curve with the smooth curvature tendency. With this estimated curve, V-Band Mura defects could be detected easily. The FOS surface reconstruction verifies this detection approach in a reasonable way. Either for the Cluster Mura detection approach or for the V-Band Mura detection approach, the simulation results demonstrate the LOG filters is very useful in the development of detection algorithms for automatic optical inspection of Mura-like defects.

Paper Details

Date Published: 24 February 2005
PDF: 9 pages
Proc. SPIE 5679, Machine Vision Applications in Industrial Inspection XIII, (24 February 2005); doi: 10.1117/12.586688
Show Author Affiliations
Hsin-Chia Chen, National Chiao Tung Univ. (Taiwan)
Li-Te Fang, National Chiao Tung Univ. (Taiwan)
Louis Lee, Taiwan TFT-LCD Association (Taiwan)
Chao-Hua Wen, Taiwan TFT-LCD Association (Taiwan)
Shang-Yuan Cheng, Industrial Technology Research Institute (Taiwan)
Sheng-Jyh Wang, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 5679:
Machine Vision Applications in Industrial Inspection XIII
Jeffery R. Price; Fabrice Meriaudeau, Editor(s)

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