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Proceedings Paper

Integrated facility of UV and IR laser process to enhance laser damage resistance of large scale 3w optics
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Paper Abstract

A new facility has been designed to enhance laser damage resistance at 351 nm of large scale 3w KDP and silica optics by laser treatment. This facility is a prototype, and the process will be industrialized as a means of fabrication of the LMJ optics. The first step of the process is a conditioning/initiation step, which consists of a UV laser raster scan of the whole optics; the second step is a step of detection and analysis of damage possibly initiated during the previous step; the third step is a mitigation step, which consists of a local melting of the detected damage on silica surface, in order to stop their growth. The facility is equipped with a 3w Nd:YAG laser allowing the process of both KDP and silica. A CO2 laser is used for damage mitigation. Both the lifetime increase and the reduction of the process duration of large scale optics have been taken into account with a view to industrialize the process.

Paper Details

Date Published: 21 February 2005
PDF: 10 pages
Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); doi: 10.1117/12.585001
Show Author Affiliations
Annelise During, Commissariat a l'Energie Atomique (France)
Laurent Lamaignere, Commissariat a l'Energie Atomique (France)
Philippe R. Bouchut, Commissariat a l'Energie Atomique (France)
Herve Piombini, Commissariat a l'Energie Atomique (France)

Published in SPIE Proceedings Vol. 5647:
Laser-Induced Damage in Optical Materials: 2004
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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