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Proceedings Paper

Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application
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Paper Abstract

The complete evaluation in the selection of coating designs for production of high performance mirrors must include the scattering losses that are associated with the thin film materials combination. This is especially true for deep ultraviolet [DUV] microlithography applications. Scattering loss data are presented at 193 nm for various coating material designs for operation in argon fluoride laser systems. For overall optimum performance tradeoffs of the spectral reflectance, environmental stability and pulsed laser irradiation lifetime survivability is also discussed.

Paper Details

Date Published: 21 February 2005
PDF: 14 pages
Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); doi: 10.1117/12.584743
Show Author Affiliations
J. Earl Rudisill, Newport Corp. (United States)
Angela Dupparre, Fraunhofer-Institut fur Angewandte Optik und Feinmechanik (Germany)
Sven Schroeder, Fraunhofer-Institut fur Angewandte Optik und Feinmechanik (Germany)

Published in SPIE Proceedings Vol. 5647:
Laser-Induced Damage in Optical Materials: 2004
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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