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Proceedings Paper

Excimer laser conditionning of KDP: influence of the laser parameters and crystal orientation on the laser damage threshold
Author(s): David Damiani; Herve Piombini; Daniel Plessis; Thierry Donval; Laurent Lamaignere; Marc Loiseau
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Paper Abstract

We perform thne conditioning of various KDP crystals with a XeF excimer laser working at 351 nm. We determine the maximum available excimer laser fluence for conditioning without damage initiation within the crystal. We demonstrate enhancement of the damage resistance with the increase of the cumulative excimer laser fluence. Using the conditioning parameters we show that the damage resistance is also dependent on the crystalline orientation of the KDP samples.

Paper Details

Date Published: 21 February 2005
PDF: 8 pages
Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); doi: 10.1117/12.584707
Show Author Affiliations
David Damiani, CEA Le Ripault (France)
Herve Piombini, CEA Le Ripault (France)
Daniel Plessis, CEA Le Ripault (France)
Thierry Donval, CEA, CESTA (France)
Laurent Lamaignere, CEA, CESTA (France)
Marc Loiseau, CEA, CESTA (France)

Published in SPIE Proceedings Vol. 5647:
Laser-Induced Damage in Optical Materials: 2004
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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