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Proceedings Paper

Both holographic and electron-beam recording in new carbazolyl-containing photoresists
Author(s): Andrei M. Andries; Valeriu V. Bivol; Okan K. Ersoy; Stephan V. Robu; Sergei A. Sergeev; Lyudmila A. Vlad
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Paper Abstract

Electron-beam and holographic recording of diffraction gratings was processed in the layers of poly-N-poxypropylcarbazole (PEPC) and co-polymers of carbazolylalkylmethacrylate with octylmethacrylate (CAM:OMA) containing additions of CHI3. The dependence of the diffraction efficiency of planar gratings on the recording current was studied. The influence of post-effect and storage in the dark on the diffraction efficiency is considered. By chemical development technique the reflecting relief diffraction gratings are obtained with the diffraction efficiency of 25-30%.

Paper Details

Date Published: 21 October 2004
PDF: 13 pages
Proc. SPIE 5581, ROMOPTO 2003: Seventh Conference on Optics, (21 October 2004); doi: 10.1117/12.582924
Show Author Affiliations
Andrei M. Andries, Ctr. of Optoelectronics (Moldova)
Valeriu V. Bivol, Ctr. of Optoelectronics (Moldova)
Okan K. Ersoy, Purdue Univ. (United States)
Stephan V. Robu, Ctr. of Optoelectronics (Moldova)
Sergei A. Sergeev, Ctr. of Optoelectronics (Moldova)
Lyudmila A. Vlad, Ctr. of Optoelectronics (Moldova)


Published in SPIE Proceedings Vol. 5581:
ROMOPTO 2003: Seventh Conference on Optics
Valentin I. Vlad, Editor(s)

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