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Proceedings Paper

Frequency dependency of the characteristics in spiral-type thin film inductors
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Paper Abstract

In this study, spiral inductors on the SiO2/Si(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of 0.7~2.0 μm was deposited on the substrate. Square inductors were fabricated through the wet chemical etching technique. The inductors are completely specified by the number of turns, coil width and the coil spacing. Both the width and spacing were varied from 10 to 50 μm and from 20 to 70 μm, respectively. The Frequency dependency of inductance and Q factor were investigated to analyze the performance of spiral inductors.

Paper Details

Date Published: 23 February 2005
PDF: 8 pages
Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); doi: 10.1117/12.582204
Show Author Affiliations
Bok-Ki Min, Korea Electrotechnology Research Institute (South Korea)
In-Sung Kim, Korea Electrotechnology Research Institute (South Korea)
Jae-Sung Song, Korea Electrotechnology Research Institute (South Korea)


Published in SPIE Proceedings Vol. 5650:
Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II
Jung-Chih Chiao; David N. Jamieson; Lorenzo Faraone; Andrew S. Dzurak, Editor(s)

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