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Proceedings Paper

Dynamics of S production in the 193-nm photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S
Author(s): Chung-Lin Liao; C.-W. Hsu; Cheuk Yiu Ng
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Paper Abstract

The production of S(3P, 1D, 1S) in the 193 nm photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S has been studied using 2 + 1 REMPI techniques. The 193 nm photodissociation cross sections of the radicals CH3S and HS initially formed in the photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S have been determined as 1 X 10-18 cm2 using a rate equation scheme. The dominant product from CH3S is S(1D), while that from SH is S(3P). The formation of S(3P) in the 1-photon (193 nm) photodissociation of CH3SSCH3 is also observed.

Paper Details

Date Published: 1 April 1992
PDF: 9 pages
Proc. SPIE 1638, Optical Methods for Time- and State-Resolved Chemistry, (1 April 1992); doi: 10.1117/12.58141
Show Author Affiliations
Chung-Lin Liao, Ames Lab./USDOE and Iowa State Univ. (United States)
C.-W. Hsu, Ames Lab./USDOE and Iowa State Univ. (United States)
Cheuk Yiu Ng, Ames Lab./USDOE and Iowa State Univ. (United States)


Published in SPIE Proceedings Vol. 1638:
Optical Methods for Time- and State-Resolved Chemistry
Cheuk-Yiu Ng, Editor(s)

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