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Proceedings Paper

Gabor filters and SVM classifier for pattern wafer segmentation
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Paper Abstract

In the last decade, the accessibility of inexpensive and powerful computers has allowed true digital holography to be used for industrial inspection using microscopy. This technique allows capturing a complex image of a scene (i.e. containing magnitude and phase), and reconstructing the phase and magnitude information. Digital holograms give a new dimension to texture analysis since the topology information can be used as an additional way to extract features. This new technique can be used to extend previous work on image segmentation of patterned wafers for defect detection. This paper presents a comparison between the features obtained using Gabor filtering on complex images under illumination and focus variations.

Paper Details

Date Published: 1 November 2004
PDF: 8 pages
Proc. SPIE 5607, Wavelet Applications in Industrial Processing II, (1 November 2004); doi: 10.1117/12.581242
Show Author Affiliations
Pierrick T. Bourgeat, Le2i, Univ. de Bourgogne (France)
Fabrice Meriaudeau, Le2i, Univ. de Bourgogne (France)
Patrick Gorria, Le2i, Univ. de Bourgogne (France)
Kenneth W. Tobin, Oak Ridge National Lab. (United States)


Published in SPIE Proceedings Vol. 5607:
Wavelet Applications in Industrial Processing II
Frederic Truchetet; Olivier Laligant, Editor(s)

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