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Proceedings Paper

Peculiar properties of LC orientation by thin inorganic oxide films obtained by glow discharge plasma
Author(s): Yu. Kolomzarov; Pavel Oleksenko; Viktor Sorokin; P. Tytarenko; R. Zelinskyy
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Paper Abstract

Orienting properties of thin inorganic oxide films created by the method of reactive cathode sputtering in glow discharge plasma are demonstrated. The quality of homogeneous and twist alignment of nematic LC was evaluated by polarization microscopy methods. For comparison of orienting properties of silicon oxide films, the parameter of twist orientation quality was used, and its dependence on technological parameters of sputtering (such as cathode voltage, discharge current density, deposition angle, content of gas atmosphere) was shown. The morphologies of SiOx orienting layers deposited on substrates with different coatings are demonstrated.

Paper Details

Date Published: 1 September 2004
PDF: 6 pages
Proc. SPIE 5565, XV Conference on Liquid Crystals, (1 September 2004); doi: 10.1117/12.581212
Show Author Affiliations
Yu. Kolomzarov, Institute of Semiconductor Physics (Ukraine)
Pavel Oleksenko, Institute of Semiconductor Physics (Ukraine)
Viktor Sorokin, Institute of Semiconductor Physics (Ukraine)
P. Tytarenko, Institute of Semiconductor Physics (Ukraine)
R. Zelinskyy, Institute of Semiconductor Physics (Ukraine)

Published in SPIE Proceedings Vol. 5565:
XV Conference on Liquid Crystals
Jozef Zmija, Editor(s)

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