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Proceedings Paper

Development of new chrome blanks for 65-nm node and beyond
Author(s): Masahiro Hashimoto; Takeyuki Yamada; Minoru Sakamoto; Mutsumi Hara; Yasushi Ohkubo II; Masao Ushida
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Paper Abstract

For advanced reticle fabrication, a resist thinning technique continues a promising trend of the resolution enhancement. To bring out thin resist performances, a new chrome absorber has been developed for the second layer of 193nm att-PSM. The new chrome absorber is thinner and has a higher dry-etch rate than our current products, such as NTAR5. This new chrome absorber can utilize a super thin resist application because of a reduction in dry-etching time. Additionally, a technique of film stress reduction was also developed to reduce placement shift by film stress relaxation. The new chrome absorber with super thin resist (TF blanks) exceeds current products in the mask-making metrics of resolution and CD performance. This performance will meet the requirements of 65nm-node and beyond.

Paper Details

Date Published: 6 December 2004
PDF: 9 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.580776
Show Author Affiliations
Masahiro Hashimoto, Hoya Corp. (Japan)
Takeyuki Yamada, Hoya Corp. (Japan)
Minoru Sakamoto, Hoya Corp. (Japan)
Mutsumi Hara, Hoya Corp. (Japan)
Yasushi Ohkubo II, Hoya Corp. (Japan)
Masao Ushida, Hoya Corp. (Japan)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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