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Proceedings Paper

Enhancement of unified mask data formats for EB writers
Author(s): Toshio Suzuki; Junji Hirumi; Nobuyuki Yoshioka; Yutaka Hojyo; Yuichi Kawase; Shinji Sakamoto; Koki Kuriyama; Syogo Narukawa; Morihisa Houga
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Paper Abstract

We have developed a unified mask data format named “OASIS.NEO1” for Variable-Shaped-Beam (VSB) EB writers as enhancement of unified mask data format named “NEO2”. OASIS.NEO is a pattern data format based on OASISTM3 released as GDSII replacement by SEMI. We have developed OASIS.NEO for practical use of unified mask data formats in mask data preparation (MDP) flow. For practical use, it is necessary to input OASIS.NEO data directly to VSB EB writers just like the native EB data. So we have defined restrictions on OASIS for VSB EB writers referring the restrictions in NEO based on GDSII named “GDSII.NEO4”. In this paper we proposed the specification of OASIS.NEO.

Paper Details

Date Published: 6 December 2004
PDF: 9 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.579130
Show Author Affiliations
Toshio Suzuki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Junji Hirumi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yutaka Hojyo, Hitachi High-Technologies Corp. (Japan)
Yuichi Kawase, JEOL Ltd. (Japan)
Shinji Sakamoto, NuFlare Technology Inc. (Japan)
Koki Kuriyama, Dai Nippon Printing Co., Ltd. (Japan)
Syogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Houga, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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