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Proceedings Paper

Integrated micromachined filters for wavelength division multiplexing
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Paper Abstract

Using deep-dry etching techniques it is possible to realise filters for use in optical telecommunication based on silicon/air cavities with a high degree of finesse, and which are oriented substantially perpendicular to the surface of the silicon substrate. This geometry is well suited to their incorporation in hollow-waveguides or within ridge waveguide structures. The optical characteristics of such devices are determined by a number of factors, including the designs of the optical cavities and the degree of surface perfection achievable by the deep-dry etching process.

Paper Details

Date Published: 30 November 2004
PDF: 7 pages
Proc. SPIE 5618, Integrated Optical Devices, Nanostructures, and Displays, (30 November 2004); doi: 10.1117/12.578554
Show Author Affiliations
Keith L. Lewis, QinetiQ (United Kingdom)
Gilbert W. Smith, QinetiQ (United Kingdom)
Mark E. McNie, QinetiQ (United Kingdom)

Published in SPIE Proceedings Vol. 5618:
Integrated Optical Devices, Nanostructures, and Displays
Keith L. Lewis, Editor(s)

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