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Proceedings Paper

Holography in photoresist materials: 1991 update
Author(s): Thomas J. Cvetkovich
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Paper Abstract

Salient factors are discussed for the production of holograms in photoresist materials including; choosing and handling photoresist emulsions and establishing criteria for properly exposing and developing photoresist to produce high quality rainbow images. Comparisons are drawn with the more familiar silver halide emulsions and with microlithography where such comparisons are deemed helpful.

Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1600, Intl Symp on Display Holography, (1 January 1992); doi: 10.1117/12.57783
Show Author Affiliations
Thomas J. Cvetkovich, Chromagem, Inc. (United States)

Published in SPIE Proceedings Vol. 1600:
Intl Symp on Display Holography
Tung H. Jeong, Editor(s)

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