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Proceedings Paper

Imaging simulation of maskless lithography using a DMD
Author(s): Chi Liu; Xiaowei Guo; Fuhua Gao; Boliang Luo; Xi Duan; Jinglei Du; Chuankai Qiu
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Paper Abstract

A maskless lithography imaging simulation using digital micromirror device (DMD) was investigated. The DMD acts as a reflective spatial light modulator. The micro-mirrors on DMD can be instructed by the computer to tilt them ±12° off their normal position which produces a mask pattern, and then the mask pattern can be carried onto the surface of wafer by the imaging system. Because the imaging of the maskless lithography is a complex process, it is necessary to simulate and analyze its practical process. In this paper, we present a partial coherent imaging model of maskless lithography considering the practical projection characterization of DMD. With the model, it is convenient to simulate the lithography of arbitrarily shaped microstructure using DMD. Through calculation, the spatial image in maskless lithography process based on gray scale photolithography with DMD real-time masks was obtained.

Paper Details

Date Published: 27 January 2005
PDF: 8 pages
Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); doi: 10.1117/12.577352
Show Author Affiliations
Chi Liu, Sichuan Univ. (China)
Xiaowei Guo, Sichuan Univ. (China)
Fuhua Gao, Sichuan Univ. (China)
Boliang Luo, Sichuan Univ. (China)
Xi Duan, Sichuan Univ. (China)
Jinglei Du, Sichuan Univ. (China)
Chuankai Qiu, State Key Lab. of Optical Technology on Microfabrication, CAS (China)


Published in SPIE Proceedings Vol. 5645:
Advanced Microlithography Technologies
Yangyuan Wang; Jun-en Yao; Christopher J. Progler, Editor(s)

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