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Proceedings Paper

Photolithography for the static compensation of human eye aberrations
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Paper Abstract

Recent developments in human eye aberration measurements allow to design and fabricate compensating elements aiming to achieve aberration-limited imaging. This is important not merely from a subject's viewpoint (improving the sharpness of the outer world images formed at the retina) but mainly for clinical instrumentation purposes, especially those dealing with high-resolution retinal imaging (eye fundus cameras, scanning laser ophtlalmosopes, etc.). Here we report recent developments in the correction of the static component of the eye aberrations. Aberration data of several subjects were used for manufacturing personally customized phase plates designed to compensate for the wave aberration in the human eye. These plates were made by gray-level single-mask photosculpture in photoresist and then placed in front of the eye. The effects of misalignments as well as the strategy to design wide-field correcting elements are briefly revised. Applications include improving images in scanning laser ophtalmoscopes. The future plans of research including application of axicons for compensation of the lack of accommodation and kinoforms cancelling high amounts of eye's aberrations in monochromatic illumination are also sketched.

Paper Details

Date Published: 26 August 2004
PDF: 6 pages
Proc. SPIE 5566, Optical Security and Safety, (26 August 2004); doi: 10.1117/12.577111
Show Author Affiliations
Salvador Bara, Univ. Santiago de Compostela (Spain)
Zbigniew Jaroszewicz, Institute of Applied Optics (Poland)

Published in SPIE Proceedings Vol. 5566:
Optical Security and Safety
Zbigniew Jaroszewicz; Ewa Powichrowska; Mariusz Szyjer, Editor(s)

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