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Proceedings Paper

Fabrication of PDMS (poly-dimethyl siloxane) molding and 3D structure by two-photon absorption induced by an ultrafast laser
Author(s): Shin Wook Yi; Seong Ku Lee; Mi Jung Cho; Hong Jin Kong; Dong-Yol Yang; Sang-hu Park; Tae-woo Lim; Ran Hee Kim; Kwang-Sup Lee
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Paper Abstract

Multi-photon absorption phenomena induced by ultra fast laser have been considered for many applications of microfabrications such as metal ablation, glass etching and photopolymerization. Among the applications, the photopolymerization by two-photon absorption (TPA) has been regarded as a new microfabricating method. It is possible to be used in photo mask correcting, diffractive optical element and micro machining. The TPA photopolymerization is made possible to fabricate a complicated three dimensional structure which the conventional photomask technology has not been able to make. Furthermore the TPA photopolymerization process applied to a two dimensional structure fabrication may take shorter time than the old process since the absence of etching and deposition processes. Recently we have made a simple 3D structure and applied the technique to PDMS(poly-dimethyl siloxane) molding.

Paper Details

Date Published: 30 December 2004
PDF: 11 pages
Proc. SPIE 5641, MEMS/MOEMS Technologies and Applications II, (30 December 2004); doi: 10.1117/12.576633
Show Author Affiliations
Shin Wook Yi, Korea Advanced Institute of Science and Technology (South Korea)
Seong Ku Lee, Korea Advanced Institute of Science and Technology (South Korea)
Mi Jung Cho, Korea Advanced Institute of Science and Technology (South Korea)
Hong Jin Kong, Korea Advanced Institute of Science and Technology (South Korea)
Dong-Yol Yang, Korea Advanced Institute of Science and Technology (South Korea)
Sang-hu Park, Korea Advanced Institute of Science and Technology (South Korea)
Tae-woo Lim, Korea Advanced Institute of Science and Technology (South Korea)
Ran Hee Kim, Hannam Univ. (South Korea)
Kwang-Sup Lee, Hannam Univ. (South Korea)


Published in SPIE Proceedings Vol. 5641:
MEMS/MOEMS Technologies and Applications II
Zhichun Ma; Guofan Jin; Xuyuan Chen, Editor(s)

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