Share Email Print

Proceedings Paper

The study on causes and control methods of haze contamination
Author(s): Sung-Jae Han; Bo-Hye Kim; Jin-Hong Park; Yong-Hoon Kim; Seong-Woon Choi; Woo-Sung Han
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Haze is a kind of surface contamination on photomask and lithography optics that made by photochemical reaction. There are many problems in photomask manufacturing, inspection and lithography process because of slowly growing feature of haze. In the photolithography process, the wafer damage has been occurred due to the time dependent growth of haze. In this study, we identified the origin and formation mechanism of haze using accelerated contamination experiments, also developed control methods for haze. From these results we expect that the photocontamination control technology should be developed and been a important part of NGL technology.

Paper Details

Date Published: 27 January 2005
PDF: 5 pages
Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); doi: 10.1117/12.576605
Show Author Affiliations
Sung-Jae Han, Samsung Electronics Co., Ltd. (South Korea)
Bo-Hye Kim, Samsung Electronics Co., Ltd. (South Korea)
Jin-Hong Park, Samsung Electronics Co., Ltd. (South Korea)
Yong-Hoon Kim, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 5645:
Advanced Microlithography Technologies
Yangyuan Wang; Jun-en Yao; Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top