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Proceedings Paper

Interferometric pattern defects recognized by using wavelet transform with DSP
Author(s): Chuen-Lin Tien; Min-Chieh Lu; Wen-Fung Liu; Shung-Zeng Peng
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Paper Abstract

This paper presents a DSP-base defect recognition system by using wavelet transform and the gray level co-occurrence matrix (GLCM). It can be used to detect the texture image of wafer surface which is captured from a laser interferometer. Wavelet analysis associated with the entropy criterion appears to be a good method for recognizing automatically the defects of the interferometric patterns. Three-dimensional plots of the GLCM for various captured images have been compared and discussed. The parameter of entropy has been calculated from the GLCM and can be used as an indicator for surface flatness.

Paper Details

Date Published: 10 February 2005
PDF: 9 pages
Proc. SPIE 5638, Optical Design and Testing II, (10 February 2005); doi: 10.1117/12.576459
Show Author Affiliations
Chuen-Lin Tien, Feng Chia Univ. (Taiwan)
Min-Chieh Lu, Chung-Shan Institute of Science and Technology (Taiwan)
Wen-Fung Liu, Feng Chia Univ. (Taiwan)
Shung-Zeng Peng, Feng Chia Univ. (Taiwan)

Published in SPIE Proceedings Vol. 5638:
Optical Design and Testing II
Yongtian Wang; Zhicheng Weng; Shenghua Ye; Jose M. Sasian, Editor(s)

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