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Proceedings Paper

Modeling and simulation development of electron beam resist based on cellular automata
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Proc. SPIE 5645, Advanced Microlithography Technologies, ; doi: 10.1117/12.576178
Show Author Affiliations
Ling Li, Institute of Microelectronics (China)
Ming Liu, Institute of Microelectronics (China)
Baoqin Chen, Institute of Microelectronics (China)


Published in SPIE Proceedings Vol. 5645:
Advanced Microlithography Technologies
Yangyuan Wang; Jun-en Yao; Christopher J. Progler, Editor(s)

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