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Proceedings Paper

The application of optical resolution enhancement technology and e-beam direct writing technology in microfabrication
Author(s): Yulin Qiu; Baoqin Chen; Ming Liu; Qiuxia Xu; Lijun Xue; Liming Ren; Yong Hu; Shibing Long; Jing Lu; Xiaohui Kang; Ling Li; Jinru Li; Yueke Tang
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Paper Abstract

The Micro-processing & Nano-technology Laboratory at the Institute of Microelectronics, Chinese Academy of Sciences (CAS), is equipped with a GCA 3600F PG&3696, a JBX 6AII & JBX 5000LS EB, and an ETEC MEBES 4700S EB. For a long time we have been engaged in the research and manufacture on Optical Resolution Enhancement Technology (RET) and E-Beam Direct Writing Technology. In this paper the following technologies will be described: PSM, OPC EBDW,EPC,Match & Mixed Lithography technology. Through the application of RET in optical lithography system, we completed the 0.2 um pattern with the g line and I line light source, which is the necessary preparation for 100nm node with 193nm light source. By means of match & mixed lithography and nanofabrication technology, 20nm-50nm gate CMOS transistor and 100nm gate HEMT are successfully developed.

Paper Details

Date Published: 27 January 2005
PDF: 12 pages
Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); doi: 10.1117/12.576170
Show Author Affiliations
Yulin Qiu, Institute of Microelectronics, CAS (China)
Baoqin Chen, Institute of Microelectronics, CAS (China)
Ming Liu, Institute of Microelectronics, CAS (China)
Qiuxia Xu, Institute of Microelectronics, CAS (China)
Lijun Xue, Institute of Microelectronics, CAS (China)
Liming Ren, Institute of Microelectronics, CAS (China)
Yong Hu, Institute of Microelectronics, CAS (China)
Shibing Long, Institute of Microelectronics, CAS (China)
Jing Lu, Institute of Microelectronics, CAS (China)
Xiaohui Kang, Institute of Microelectronics, CAS (China)
Ling Li, Institute of Microelectronics, CAS (China)
Jinru Li, Institute of Microelectronics, CAS (China)
Yueke Tang, Institute of Microelectronics, CAS (China)


Published in SPIE Proceedings Vol. 5645:
Advanced Microlithography Technologies
Yangyuan Wang; Jun-en Yao; Christopher J. Progler, Editor(s)

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