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Proceedings Paper

Deep-etched fused silica grating as a (de)multiplexer for DWDM application at the 1.55-µm wavelength
Author(s): Yanyan Zhang; Changhe Zhou; Huayi Ru; Shunquan Wang
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Paper Abstract

We report on diffraction performances of deep-etched transmission gratings in fused silica at the wavelength of 1.55μm. Profile parameters of the depth and line density are optimized to achieve the first order Bragg transmitted efficiency of more than 98% theoretically under TE- or TM-polarized incident lights. Spectra performance of a 630 lines/mm grating with the depth of 3.0μm in the C+L bands is presented in which the diffraction efficiency of each spectrum can be above 90%. By holography and inductive coupled plasma (ICP) etching, we have made a fused silica grating with the period of 610lines/mm and the depth of 0.73μm, the first order Bragg diffraction efficiency of which can reach 17% at the wavelength of 1.31 µm and 10% at 1.55 μm. Our results provide an important guideline for transmission gratings in fused silica as (de)multiplexers for dense wavelength division multiplexing (DWDM) application.

Paper Details

Date Published: 7 February 2005
PDF: 5 pages
Proc. SPIE 5636, Holography, Diffractive Optics, and Applications II, (7 February 2005); doi: 10.1117/12.575200
Show Author Affiliations
Yanyan Zhang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Huayi Ru, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Shunquan Wang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)


Published in SPIE Proceedings Vol. 5636:
Holography, Diffractive Optics, and Applications II
Yunlong Sheng; Dahsiung Hsu; Chongxiu Yu; Byoungho Lee, Editor(s)

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